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Integral modeling of liquid films sheared by a gas flow
Gianluca Lavalle (ONERA)
Thin liquid films sheared by a gas flow are often encountered in industrial configurations.
When performing numerical investigations of such flows, the required computational cost can be too great.
Therefore, in this work, the liquid film is modeled by means of integrated equations, and a firstorder longwave model is presented. This model captures the correct stability threshold of long linear waves, and is able to describe the nonlinear dynamics of thin liquid film. This longwave model is coupled to NavierStokes equations accounting for the gas phase, in order to study the interactions between the two phases in narrow and large channels. A coupling numerical methodology is presented, which makes use of the ALE technique to transfer the position of the interface from the film to the gas.
Spatiotemporal evolutons of film thickness and stress fields are shown, with the purpose to compare this 'shallow waterNavier Stokes' model with both the DNS analysis and the twophase longwave models available in the literature.

